Quartz Wafer 6-Inch High Purity Double-Side Polished Substrate: Precision Engineered for Semiconductor and Optical Excellence

Introduction

In the high-stakes world of semiconductor manufacturing and advanced optics, substrate quality is a cornerstone of success. The Quartz Wafer 6-Inch High Purity Double-Side Polished Substrate is engineered to meet the rigorous demands of cutting-edge technologies. Crafted from synthetic fused silica (SiO₂) with atomic-level precision, this substrate delivers unparalleled purity, thermal resilience, and optical performance, making it indispensable for EUV lithography, MEMS devices, and high-energy laser systems.

Key Features

1. Ultra-High Purity (99.999% SiO₂)
   Synthetic fused silica with metallic impurities <1 ppm, ensuring contamination-free processes for EUV lithography and sensitive optical applications.

2. Double-Side Polished Perfection
   Both surfaces polished to <0.5 nm (Ra) roughness, enabling flawless thin-film deposition, lithography, and optical coatings.

3. Exceptional Thermal Stability
   Near-zero thermal expansion (CTE: 0.55 × 10⁻⁶/°C) maintains dimensional integrity at temperatures up to 1,200°C.

4. Broad Optical Transparency
   High transmittance (>90%) from UV (190 nm) to IR (2,500 nm), ideal for deep-UV lithography, laser optics, and space-grade sensors.

5. Chemical and Plasma Resistance
   Resists acids, alkalis, and plasma etching, ensuring durability in harsh semiconductor and cleanroom environments.

6. SEMI-Compliant Standards
   Meets SEMI specifications for flatness (<3 µm TTV), thickness uniformity (±10 µm), and defect density, compatible with 150mm fab tools.

Applications

• Semiconductor Lithography: EUV/DUV photomasks for sub-5nm chip production.

• MEMS & Sensors: Precision substrates for accelerometers, gyroscopes, and biochips.

• Advanced Optics: Lenses, prisms, and beam splitters for high-power lasers and telescopes.

• Quantum Technologies: Photonic circuits and qubit arrays in quantum computing systems.

• Aerospace & Defense: IR-transparent windows, radomes, and satellite sensor protection.

Why Choose a 6-Inch Quartz Substrate?

• Yield Optimization: Ultra-smooth surfaces minimize defects in EUV patterning and thin-film processes.

• Scalability: 6-inch (150mm) format aligns with industry standards for cost-effective high-volume production.

• Future-Ready Design: Supports next-gen innovations like 3D IC integration and integrated photonics.

• Cost Efficiency: Reusable and durable, reducing long-term operational costs.

• Regulatory Compliance: Certified to SEMI, ISO, and MIL-STD standards for quality assurance.

Conclusion

The 6-inch Quartz Wafer High Purity Double-Side Polished Substrate is a critical enabler of precision in semiconductor, optical, and quantum industries. Its unmatched purity, thermal stability, and atomic-level surface quality empower manufacturers to achieve breakthroughs in miniaturization, efficiency, and performance. For engineers and researchers pushing the boundaries of technology, this substrate is the foundation of tomorrow’s innovations.