Premium 3-Inch FZ(100) High-Resistivity Silicon Wafer
Upgrade your semiconductor projects with our 3-inch FZ(100) Silicon Wafer, engineered for ultra-high resistivity (>1000Ω and >10000Ω) and exceptional performance. Featuring a single-sided polished substrate, this wafer delivers a flawless surface finish, critical for advanced fabrication processes in electronics, MEMS, and optoelectronics.
Key Features:
Ultra-High Resistivity: >1000Ω·cm and >10000Ω·cm options for low-loss applications in high-frequency and high-power devices.
Float-Zone (FZ) Growth: Ensures minimal impurities and superior crystal quality for demanding semiconductor applications.
(100) Crystal Orientation: Optimized for epitaxial growth and compatibility with standard semiconductor manufacturing processes.
Single-Sided Polished Substrate: Provides a pristine surface for photolithography, thin-film deposition, and precise etching.
Research & development in quantum computing and photonics
Why Choose This Wafer?
Our 3-inch FZ(100) Silicon Wafer combines high resistivity, exceptional surface uniformity, and industry-leading material purity. Whether for prototyping or large-scale production, it ensures reliability in high-temperature and high-voltage environments. Trusted by engineers and researchers worldwide for cutting-edge semiconductor innovation.
